YouTube2Text

重大突破!中國新一代光刻機亮相上海進博會 國產率破90%ASML慌了參展六屆突缺席【#全球大爆卦】20261110@全球大視野Global_Vision — Transcript

by 中天電視 · 1,414 words · 244 segments · language auto · Watch on YouTube

Full transcript

  1. 0:00I have some breaking news to share: a
  2. 0:01major breakthrough. A Chinese
  3. 0:03lithography machine has entered two
  4. 0:04production lines, with a domestic
  5. 0:06localization rate exceeding 90%. Right,
  6. 0:08and it also made a stunning debut at the
  7. 0:10CIIE on this very day. Let's take a look
  8. 0:12; this new generation of Chinese
  9. 0:14lithography equipment was unveiled at
  10. 0:16the CIIE, which runs from November 5th
  11. 0:18to November 10th.
  12. 0:19Actually, just before we went live, a
  13. 0:21peer of mine in mainland China asked me
  14. 0:24, "Why didn't you come to the CIIE?"
  15. 0:26I actually really wanted to go, and I
  16. 0:28hope to have the opportunity to check it
  17. 0:30out in the future. Because at the CIIE,
  18. 0:32they always showcase some of their
  19. 0:34latest products to everyone.
  20. 0:36This time, Shanghai Micro Electronics
  21. 0:38Equipment (SMEE) showcased its
  22. 0:40self-developed new-generation front-end
  23. 0:42dry lithography machine and a scanner
  24. 0:44projection lithography model.
  25. 0:47There are two models in total, which
  26. 0:48we've found images of to show you.
  27. 0:52Furthermore, during this debut at the
  28. 0:54CIIE, SMEE also disclosed some
  29. 0:56information, including that China's
  30. 0:58current domestic localization rate has
  31. 1:00exceeded 90%, filling a gap in the
  32. 1:02domestic market.
  33. 1:06In addition, it is actually already in
  34. 1:08operation on production lines.
  35. 1:12They announced that it has supported the
  36. 1:14production of over 10 million wafers,
  37. 1:16with the effective operating rate of
  38. 1:17current domestic equipment exceeding 92
  39. 1:19%.
  40. 1:22Another point that has drawn much
  41. 1:24outside attention is that in such a
  42. 1:26large event, many international
  43. 1:27manufacturers have come to participate.
  44. 1:31For the past six years, ASML has
  45. 1:33attended, but having participated for
  46. 1:36six consecutive years since 2020, ASML
  47. 1:38is suddenly absent this year.
  48. 1:42I looked up the official reason; they
  49. 1:44stated that it conflicted with their
  50. 1:46company's internal global meetings.
  51. 1:50But they are absent, and you see, at the
  52. 1:52very moment they are absent, China
  53. 1:54unveiled two of its newest lithography
  54. 1:56machines.
  55. 1:57Let's ask Brother Daxian immediately:
  56. 1:59what does he think this move signifies?
  57. 2:02>> Right, I was also planning to attend the
  58. 2:05CIIE this time, but because of the
  59. 2:06elections in Taiwan, I had to come back
  60. 2:08to help with the campaign, so I couldn't
  61. 2:10make it to the CIIE.
  62. 2:13Let me give everyone a brief
  63. 2:14introduction: the lithography machines
  64. 2:17you hear about are divided into two
  65. 2:19types—one is called EUV, or extreme
  66. 2:21ultraviolet, and the other is called DUV
  67. 2:23, or deep ultraviolet.
  68. 2:27The difference between the two lies in
  69. 2:28the wavelength of the light source they
  70. 2:30excite; the narrower the wavelength of
  71. 2:32the light source, the more advanced the
  72. 2:34process you can perform, and the smaller
  73. 2:35you can make the chips.
  74. 2:39For Extreme Ultraviolet, known as EUV,
  75. 2:42the wavelength of the light excited from
  76. 2:44the tin droplets is approximately 13.5
  77. 2:46nanometers.
  78. 2:50Once you can achieve 13.5 nanometers,
  79. 2:53you have reached a very critical
  80. 2:54milestone in the progress of EUV
  81. 2:56technology.
  82. 2:59However, for DUV, which is called Deep
  83. 3:01Ultraviolet, the wavelength of the
  84. 3:03excited light is not as narrow as that
  85. 3:06of EUV, which is why DUV can only be
  86. 3:08used to manufacture chips with mature
  87. 3:10processes.
  88. 3:12That is the first piece of popular
  89. 3:14science I've shared with you.
  90. 3:16Secondly, we just heard Hui-lin mention
  91. 3:18"dry process." What is "dry process"?
  92. 3:21DUV can be divided into "dry" and what
  93. 3:24we call "wet" or "immersion" lithography
  94. 3:27.
  95. 3:28Where is the difference between the two
  96. 3:29?
  97. 3:32The difference lies in what is placed
  98. 3:34between the wafer—the wafer you are
  99. 3:36about to etch—and the objective lens
  100. 3:38below.
  101. 3:41If you simply place it there with air in
  102. 3:43between, that is called the dry process
  103. 3:45.
  104. 3:46But if you use pure water in between,
  105. 3:48specifically ultra-high-purity water,
  106. 3:50that is called the immersion process.
  107. 3:53Many people ask, what is the difference
  108. 3:55between dry and wet? It lies in the
  109. 3:57medium.
  110. 3:58If it is air, your refractive index is 1
  111. 4:01; if it is high-purity ultrapure water,
  112. 4:04your refractive index is 1.44.
  113. 4:09The higher the refractive index of the
  114. 4:11intermediate medium, the smaller the
  115. 4:13final size of the chip that can be
  116. 4:15produced.
  117. 4:19So, everyone can see that the chips
  118. 4:21produced by the wet process are
  119. 4:23relatively smaller because there is
  120. 4:25water in between, resulting in a higher
  121. 4:27refractive index; therefore, wet DUV can
  122. 4:29produce chips of approximately 28 to 38
  123. 4:31nanometers.
  124. 4:37As for the dry process, which I just
  125. 4:39mentioned has a lower refractive index,
  126. 4:41the chips it produces are generally 65
  127. 4:43nanometers or larger.
  128. 4:47Alright, now let’s turn back to SME,
  129. 4:49which is the Shanghai Micro Electronics
  130. 4:51Equipment Company; this company actually
  131. 4:53has three models.
  132. 4:56>> At this exhibition, everyone only
  133. 4:59noticed two models, the SSB800 and the
  134. 5:01SSC800.
  135. 5:03But in fact, there is also an SSA800
  136. 5:05model.
  137. 5:06The SSA800 model is what I am talking
  138. 5:08about; it is an immersion DUV. Yeah,
  139. 5:11>> Since it is immersion DUV, the chips it
  140. 5:13produces are smaller, at 28 nanometers.
  141. 5:15What we are currently saying about China
  142. 5:18being able to use 28nm multi-patterning
  143. 5:21starts here; its limit can reach 28nm,
  144. 5:23and this SSA800 has already entered
  145. 5:25production with a localization rate of
  146. 5:28over 85%.
  147. 5:31Now, the SB800 and SC800 you see are
  148. 5:33both dry DUVs, so the chips they produce
  149. 5:36are relatively larger, which are mature
  150. 5:38process chips.
  151. 5:42The SB800 uses i-line technology, so the
  152. 5:45wavelength of the light source it
  153. 5:47excites is about 365 nanometers.
  154. 5:50With a 365nm wavelength, the chip size
  155. 5:53it can produce is between about 250nm
  156. 5:56and 350nm, and the localization rate
  157. 5:58exceeds 90%.
  158. 5:59>> As for the SSC800, it uses KrF
  159. 6:02technology, so the light wavelength it
  160. 6:04excites is narrower, about 248
  161. 6:06nanometers, so the chip size it can
  162. 6:09produce is between about 110nm and 180nm
  163. 6:12, and the localization rate also exceeds
  164. 6:1590%. Many people always talk about
  165. 6:17multi-patterning when discussing this,
  166. 6:20saying they can use multi-patterning to
  167. 6:22turn 28nm into 7nm. Does everyone know
  168. 6:24what multi-patterning is?
  169. 6:26Let me give you an example:
  170. 6:28multi-patterning is like wanting to draw
  171. 6:30two very thin parallel lines on a wall,
  172. 6:32but you only have a very thick brush.
  173. 6:34What would you do?
  174. 6:37As you can see, DUV is like that thick
  175. 6:39brush because its light wavelength is
  176. 6:41too long and too wide, so their method
  177. 6:43is: you take that brush and paint a
  178. 6:45stroke on the wall first.
  179. 6:49After you paint one stroke, you apply a
  180. 6:51special substance to both sides, and
  181. 6:53then what do you do next?
  182. 6:56You dig out and etch away the middle
  183. 6:58part.
  184. 6:59Yeah,
  185. 6:59>> After you remove that, aren't you left
  186. 7:01with just two edge lines? You are left
  187. 7:04with two very narrow lines; this is what
  188. 7:06we call multi-patterning, explained in
  189. 7:08simple terms. So how is multi-patterning
  190. 7:10done? First, you need to perform an
  191. 7:12initial exposure, then move to the
  192. 7:13second step of deposition, which
  193. 7:15involves depositing material on both
  194. 7:17sides. Third, you need to etch, clearing
  195. 7:19out the center. Fourth, you need to
  196. 7:21deposit again, which requires another
  197. 7:22exposure. This is called
  198. 7:24multi-patterning. Repeatedly performing
  199. 7:26this multi-patterning lowers the yield
  200. 7:27each time, because getting the alignment
  201. 7:29right for these repeated exposures is
  202. 7:31not an easy task. So, the
  203. 7:33multi-patterning that Mainland China is
  204. 7:35currently capable of is what SMIC is
  205. 7:37doing for Huawei’s 7nm Kirin chips. Its
  206. 7:39yield is probably only around 50%. A 50
  207. 7:41%yield means the cost is double that of
  208. 7:44TSMC’s—it’s effectively two times higher
  209. 7:47. But for Mainland China, I believe they
  210. 7:49can afford it. The priority now is
  211. 7:51whether or not there are chips available
  212. 7:53; it’s no longer a question of yield.
  213. 7:56Therefore, in the short term, using this
  214. 7:58multi-patterning method—despite the low
  215. 8:00yield and high costs—is sufficient to
  216. 8:02meet their current demands.
  217. 8:05So, what will we see next? It is the
  218. 8:0713.5 nm extreme ultraviolet light I
  219. 8:09mentioned, which has actually been
  220. 8:11developed by domestic companies in
  221. 8:13Mainland China. So, when it comes to the
  222. 8:15mass production of EUV lithography
  223. 8:17machines, I think it will happen within
  224. 8:19the next year or two.
  225. 8:20>> Yes. Hello everyone, I’m your anchor,
  226. 8:22Lin Chia-yuan. With high stress in life
  227. 8:24, insomnia and light sleep have become
  228. 8:25common troubles for modern people.
  229. 8:27Sunstar Whole-Effect Kefir Probiotics
  230. 8:29now proudly introduces the "Good Night"
  231. 8:31enhanced version, featuring four natural
  232. 8:33herbs: Ashwagandha, Tryptophan,
  233. 8:34L-Theanine, and Lemon Balm. Choose
  234. 8:36Sunstar Whole-Effect Kefir Probiotics
  235. 8:38for your daily care, keeping your body
  236. 8:40free of burden. Kefir every day, for a
  237. 8:42better life. GoodKefir, FeelGood. Please
  238. 8:45visit "Kuaidiangou" to order for your
  239. 8:46health, and enter the referral code for
  240. 8:48an extra discount.
  241. 8:54Sunstar Whole-Effect Kefir Probiotics:
  242. 8:57Basic version and Good Night enhanced
  243. 8:59version—new packaging, upgraded content
  244. 9:02.

About this transcript

This page contains the full transcript of 重大突破!中國新一代光刻機亮相上海進博會 國產率破90%ASML慌了參展六屆突缺席【#全球大爆卦】20261110@全球大視野Global_Vision by 中天電視, generated from the public captions YouTube serves with the video. The transcript has 1,414 words across 244 segments, with the original timestamps preserved so you can click any line to jump to that moment in the embedded player.

What you can do with it

Use the transcript to take notes, quote the speaker, build a study guide, generate a summary with ChatGPT or Claude via the YouTube Summary tool, or export it as a timed subtitle file with YouTube to SRT. You can also re-open it in the transcriber to choose a caption track available on the video.

Free YouTube transcript tool

YouTube2Text is a free YouTube transcript generator — no signup, no daily limit. Paste any YouTube link and get the full transcript instantly, with timestamps, click-to-jump, caption language selection, AI prompts for ChatGPT, Claude, and Gemini, and exports to TXT, SRT, VTT, or Markdown.